Femtosecond laser ablation induced plasma characteristics from submicron craters in thin metal film

Applied Physics Letters

Volumn 91, Issue 25, 2007, Pages

  Hwang, David J ^a   Jeon, Hojeong ^a   Grigoropoulos, Costas P ^a   Yoo, Jong ^b   Russo, Richard E ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Applied Spectra Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRANSITIONS; FREQUENCY DOUBLERS; LASER ABLATION; ULTRASHORT PULSES; WAFER BONDING;

ABLATION THRESHOLD; FEMTOSECOND LASER ABLATION; QUARTZ WAFERS; SUBMICRON CRATERS; THIN METAL FILMS;

METALLIC FILMS;

EID: 37549003227     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2825289     Document Type: Article

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