Microphotoluminescence evaluation of local strain for freestanding Si membranes with SiN deposition

Applied Physics Letters

Volumn 91, Issue 24, 2007, Pages

  Wang, Dong ^a   Nakashima, Hiroshi ^a   Morioka, Jun ^b   Kitamura, Tokuhide ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MEMBRANES; PHOTOLUMINESCENCE;

EXCITON BAND-BAND TRANSITION; MESA ETCHING; MICROPHOTOLUMINESCENCE EVALUATION;

SILICON;

EID: 37149037108     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2825271     Document Type: Article

References (11)

1. H. Nii, T. Yamada, K. Inoh, T. Shino, S. Kawanaka, M. Yoshimi, and Y. Katsumata, IEEE Trans. Electron Devices 47, 1536 (2000).
2. P. Puech, F. Demangeot, J. Frandon, C. Pinquier, M. Kuball, V. Domnich, and Y. Gogotsi, J. Appl. Phys. 96, 2853 (2004).
3. S. Mochizuki, A. Sakai, N. Taoka, O. Nakatsuka, S. Takeda, S. Kimura, M. Ogawa, and S. Zaima, Thin Solid Films 508, 128 (2006).
4. D. Wang, H. Nakashima, K. Matsumoto, and M. Nakamae, Appl. Phys. Lett. 87, 251928 (2005).
5. P. J. Dean, J. R. Haynes, and W. F. Flood, Phys. Rev. 161, 711 (1967).
6. J. Shah, M. Combescot, and A. H. Dayem, Phys. Rev. Lett. 38, 1497 (1977).
7. M. Tajima and S. Ibuka, J. Appl. Phys. 84, 2224 (1998).
8. M. V. Fischetti and S. E. Laux, J. Appl. Phys. 80, 2234 (1996).
9. J. J. Wortman and R. A. Evans, J. Appl. Phys. 36, 153 (1965).
10. A. Kaushik, H. Kahn, and A. H. Heuer, J. Microelectromech. Syst. 14, 359 (2005).
11. A. Díaz, S. Hampshire, J.-F. Yang, T. Ohji, and S. Kanzaki, J. Am. Ceram. Soc. 88, 698 (2005).