Application of contrast enhancement layer to 193 nm lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2466-2470

  Kim, Ryoung Han ^a   Levinson, Harry J ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTRAST ENHANCEMENT LAYER; THICK TOPCOAT;

ABERRATIONS; FINITE DIFFERENCE TIME DOMAIN METHOD; NONLINEAR ANALYSIS;

NANOLITHOGRAPHY;

LITHOGRAPHY;

EID: 37149031268     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2798705     Document Type: Article

References (9)

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