Data preparation for EBDW

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Thrum, Frank ^a   Kretz, Johannes ^a   Lutz, Tarek ^a   Keil, Katja ^e   Arndt, Christian ^a   Choi, Kang Hoon ^a   Baetz, Ullrich ^b   Belie, Nikola ^c   Lemke, Melchior ^d   Denker, Ulrich ^d   Gramss, Juergen ^d   Kliem, Karl Heinz ^d  

^a QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^b FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS   (Germany)

^c PDF Solutions GmbH   (Germany)

^d Vistec Electron Beam GmbH   (Germany)

^e Fraunhofer Center Nanoelectronic Technologies   (Germany)

Author keywords

e beam; EBDW; PEC; Proximity effect correction; Shaped beam; Vistec SB351 3050 DW

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER OPERATING SYSTEMS; ELECTRON BEAMS; MASKS; PARAMETER ESTIMATION; PHOTOLITHOGRAPHY;

E-BEAMS; NANOELECTRONIC TECHNOLOGY (CNT); PROXIMITY EFFECT CORRECTION (PEC) OF; SHAPED BEAMS;

SILICON WAFERS;

EID: 35649018159     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.736976     Document Type: Conference Paper

References (4)

1. J. Gramss, M. Lemke, H. Eichhorn, V. Neick, M. Kramer, E.Stache;"Application results achieved with LINUX Cluster for data preparation"; Proceedings of SPIE , Volume 52130, pp. 672-680
2. J.Gramss, H. Eichhorn, M. Lemke, R. Jaritz, V. Neick, D. Beyer, B. Buerger, U. Baetz, K. Kunze, N.Belic; "Data Prep - The Bottleneck of Future Applications?"; EMLC 2006
3. N. Belic, R. Jaritz, P.Hudek, H. Eisenmann, Efficient e-beam proximity correction for high acceleration voltages, Proc. of mask patterning for the lOOnm technology node, SEMICON Europe 2002, SEMI Presents.
4. S. MANAKLI, C. SOONEKINDT, L. PAIN, J. TODESCHINI, B. ICARD, B. MINGHETTI, presentation at SPIE Microlithography 2006, 19-24 February 2006,San Jose, California USA