Hybrid optical - Electron-beam resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Lennon, D M ^a   Spector, S J ^a   Fedynyshyn, T H ^a   Lyszczarz, T M ^a   Rothschild, M ^a   Thackeray, J ^b   Spear Alfonso, K ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b ROHM AND HAAS COMPANY   (United States)

Author keywords

193 immersion lithography; Electron beam lithography; Hybrid lithography

Indexed keywords

193 IMMERSION LITHOGRAPHY; HYBRID LITHOGRAPHY; IMMERSION STEPPER; WAFER LEVEL;

FEATURE EXTRACTION; OPTICAL SYSTEMS; PARAMETER ESTIMATION; PHOTORESISTORS; TIME DELAY;

ELECTRON BEAMS;

EID: 35148897824     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.714370     Document Type: Conference Paper

References (5)

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