Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2379-2383

  Sirotkin, V ^a   Svintsov, A ^a   Zaitsev, S ^a   Schift, H ^b  

^a INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; GRAIN SIZE AND SHAPE; NANOIMPRINT LITHOGRAPHY; THICKNESS MEASUREMENT;

RESIST THICKNESS;

VISCOUS FLOW;

EID: 37149008375     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2812534     Document Type: Article

References (7)

1. H. Schift and L. J. Heyderman, Alternative Lithography, edited by, C. M. Sotomayor Torres, Nanostructure Science and Technology (Kluwer Academic DordrechtPlenum, New York, 2003), Chap., pp. 47-76.
2. L. J. Guo, J. Phys. D 37, R123 (2004).
3. H. D. Rowland, A. C. Sun, P. R. Schunk, and W. P. King, J. Micromech. Microeng. 15, 2414 (2005).
4. V. Sirotkin, A. Svintsov, S. Zaitsev, and H. Schift, Microelectron. Eng. 83, 880 (2006).
5. V. Sirotkin, A. Svintsov, H. Schift, and S. Zaitsev, Microelectron. Eng. 84, 868 (2007).
6. L. D. Landau and E. M. Lifshitz, Theory of Elasticity (Pergamon, Oxford, 1986), Vol. 7, p. 108.
7. NaPa project, Integrated Project, EU Sixth Frame Program (http://www.phantomsnet.net/NAPA/index.php).