Application of an alternating phase-shifting mask design method to near-field photolithography for fabricating more than 2 GHz SAW devices

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control

Volumn 54, Issue 10, 2007, Pages 2208-2213

  Lai, Fu Der ^a   Hua, Jui Ming ^a   Huang, Hao Min ^b  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC SURFACE WAVE FILTERS; ACOUSTIC TRANSDUCERS; LINEWIDTH; PHASE SHIFT; PHOTOLITHOGRAPHY; WAVELENGTH;

INTERDIGITAL TRANSDUCERS; NEAR FIELD PHASE SHIFT LITHOGRAPHIC PROCESS; SHORT OPTICAL DISTANCE;

MASKS;

EID: 37049026194     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/TUFFC.2007.518     Document Type: Article

References (8)

1. J. A. Rogers, K. E. Paul, R. J. Jackman, and G. M. Whitesides, "Quantifying distortions in soft lithography," J. Vac. Sci. Technol. B, vol. 16, pp. 88-97, 1998.
2. H. Engan, "Excitation of elastic surface waves by spatial harmonics of interdigital transducers," IEEE Trans. Electron. Devices, vol. ED-16, pp. 1014-1017, 1969.
3. Y. H. Kim, J. H. Park, K. H. Lee, S. W. Choi, H. S. Yoon, and J. M. Sohn, "Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems," SPIE Proc., vol. 3748, pp. 332-339, 1999.
4. T. Hesjedal, W. Seidel, and H. Kostial, "Near-field phase shift photolithography for high-frequency SAW transducers," in Proc. IEEE Ultrason. Symp., 2002, pp. 247-250.
5. K. Yamanouchi and H. Furuyashiki, "New low-loss SAW filter using internal floating electrode reflection types of single-phase unidirectional transducer," Electron. Lett., vol. 20, no. 24, pp. 989-990, Jul. 1984.
6. M. Takeuchi and K. Yamanouchi, "Coupled mode analysis of SAW floating electrode type unidirectional transducers," IEEE Trans. Ultrason., Ferroelect., Freq. Contr., vol. 40, no. 6, pp. 648-658, Nov. 1993.
7. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, "Improving resolution in photolithography with a phase-shifting mask," IEEE Trans. Electron. Devices, vol. ED-29, pp. 1828- 1836, Dec. 1982.
8. 2 multilayer films for the 65 nm technology node," J. Vac. Sci. Technol. B, vol. 22, no. 6, pp. 3097-3101, Nov./Dec. 2004.