Characteristics of silicone resins as base amplifiers and their applications to photopatterning

Journal of Photopolymer Science and Technology

Volumn 16, Issue 1, 2003, Pages 81-82

  Morikawa, Yuichi ^a   Arimitsu, Koji ^a   Gunji, Takahiro ^a   Abe, Yoshimoto ^a   Ichimura, Kunihiro ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Base amplifier; Base proliferation reaction; Photoresist; Silicone resin

Indexed keywords

RESIN; SILICONE;

ABSORPTION SPECTROSCOPY; AMPLIFIER; ARTICLE; CATALYSIS; DECOMPOSITION; INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOSENSITIVITY; POLYMERIZATION; ULTRAVIOLET IRRADIATION;

EID: 0038506829     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.81     Document Type: Article

References (8)

1. a) K. Arimitsu, M. Miyamoto, K. Ichimura, Proc. ACS PMSE, 81, 93 (1999);
2. b) Arimitsu, M. Miyamoto, K. Ichimura, Angew. Chem. Int. Ed., 39, 3425 (2000);
3. c) K. Ichimura, Chem. Rec., 2, 46 (2002).
4. M. Miyamoto, K. Arimitsu, K. Ichimura, J. Photopolym. Sci. Technol., 12, 315 (1999).
5. K. Arimitsu, M. Hashimoto, T. Gunji, Y. Abe, K. Ichimura, J. Photopolym. Sci. Technol., 15, 41 (2002).
6. K. Arimitsu, Y. Morikawa, T. Gunji, Y. Abe, K. Ichimura, Proc. RadTech Asia '03, in press.
7. H. Namatsu, A. Yoshikawa, Proc. Electrochem. Soc., 88, 150 (1988).
8. E. J. Urankar, I. Berhem, Q. J. Niu, J. M. J. Fréchet, Macromolecules, 30, 1304 (1997).