Photogenerated Base in Resist and Imaging Materials: Design of Functional Polymers Susceptible to Base Catalyzed Decarboxylation

Chemistry of Materials

Volumn 9, Issue 12, 1997, Pages 2887-2893

  Fréchet, Jean M J ^a,b   Leung, Man Kit ^a,b   Urankar, Edward J ^a,b   Willson, C Grant ^c,d,e   Cameron, James F ^c,d   MacDonald, Scott A ^c,d   Niesert, Claus P ^c,d  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Department of Molecular Biology and Genetics   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

^d The University of Texas at Austin   (United States)

^e UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039940603     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm970220k     Document Type: Article

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