Recent contributions of the Kaiserslautern research group to thin silicon solar cell R&D applying the HW(Cat)CVD

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 722-727

  Schroeder, Bernd ^a   Kupich, Markus ^b   Kumar, Prabhat ^c   Grunsky, Dmitry ^d  

^a University of Koblenz Landau   (Germany)

^b Balzers AG   (Liechtenstein)

^c Department of Metallurgical and Materials Engineering   (United States)

^d FZ Juelich ^*  (Germany)

Author keywords

Doped c Si films; Hot wire deposition; Solar cell stability; Ta catalyzer degradation; Thin film silicon solar cells

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEGRADATION; DOPING (ADDITIVES); HETEROJUNCTIONS; RESEARCH AND DEVELOPMENT MANAGEMENT; SILICON;

CATALYZERS; DEPOSITION SEQUENCES; HOT WIRE DEPOSITION; SOLAR CELL STABILITY;

SILICON SOLAR CELLS;

EID: 36848999411     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.078     Document Type: Article

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