Novel photoresist removal using atomic hydrogen generated by heated catalyzer

Solid State Phenomena

Volumn 92, Issue , 2003, Pages 231-234

  Miki, T ^a   Izumi, A ^a   Matsumura, H ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Atomic hydrogen; Heated catalyzer; Photoresist removal

Indexed keywords

CATALYSIS; FLUORESCENCE; HYDROGEN; ION IMPLANTATION; MASS SPECTROMETRY; PHOTORESISTS; REFLECTION; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY; ATOMS;

ATOMIC HYDROGEN; CATALYZER; PHOTORESIST REMOVAL; QUADRUPOLE MASS SPECTROSCOPY; X RAY FLUORESCENCE SPECTROSCOPY; HEATED CATALYZER; LINE-AND-SPACE PATTERNS;

REMOVAL; PHOTORESISTS;

EID: 0038715857     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.92.231     Document Type: Conference Paper

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4. A. Izumi and H. Matsumura: Jpn. J. Phys. Vol. 41 (2002) pp. 4639-4641.