Preparation and optical properties of nanocrystalline thin films in the ZnO-TiO2 system

Applied Physics A: Materials Science and Processing

Volumn 90, Issue 2, 2008, Pages 375-378

  Ye, C ^a   Pan, S S ^a   Teng, X M ^a   Fan, H T ^a   Li, G H ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT ABSORPTION; NANOCRYSTALLINE ALLOYS; OPTICAL BAND GAPS; OPTICAL CONSTANTS; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; TITANIUM DIOXIDE; ZINC OXIDE;

ATOMIC RATIO; EXTINCTION COEFFICIENT SPECTRA;

THIN FILMS;

EID: 36749059952     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-4289-x     Document Type: Article

References (31)

1. J. Ouerfelli, M. Regragui, M. Morsli, G. Djeteli, K. Jondo, C. Amory, G. Tchangbedji, K. Napo, J.C. Bernède, J. Phys. D Appl. Phys. 39, 1954 (2006)
2. S. Das, S. Chakrabarti, S. Chaudhuri, J. Phys. D Appl. Phys. 38, 4021 (2005)
3. R. Das, S. Ray, J. Phys. D Appl. Phys. 36, 152 (2003)
4. X.S. Zhou, Y.H. Lin, B. Li, L.J. Li, J.P. Zhou, C.W. Nan, J. Phys. D Appl. Phys. 39, 558 (2006)
5. P.M.R. Kumar, C.S. Katha, K.P. Vijayakumar, T. Abe, Y. Kashiwaba, F. Singh, D.K. Avasthi, Semicond. Sci. Technol. 20, 120 (2005)
6. A. Umar, S. Lee, Y.H. Im, Y.B. Hahn, Nanotechnology 16, 462 (2005)
7. A. Dey, S. De, A. De, S.K. De, Nanotechnology 15, 1277 (2004)
8. S.S. Lin, J.L. Huang, P. Sajgalik, Surf. Coat. Technol. 191, 286 (2005)
9. Y.Q. Hou, D.M. Zhuang, G. Zhang, M. Zhao, M.S. Wu, Appl. Surf. Sci. 218, 97 (2003)
10. H. Poelman, D. Poelman, D. Depla, H. Tomaszewski, L. Fiermans, R.D. Cryse, Surf. Sci. 482, 940 (2001)
11. H.X. Gong, Y.Y. Wang, Z.J. Yan, Y.H. Yang, Mater. Sci. Semicond. Process. 5, 31 (2002)
12. Z.F. Liu, Y.X. Li, F.K. Shan, Z.H. Xu, Y. Yu, Chin. Phys. Lett. 21, 747 (2004)
13. J.S.C. Prentice, J. Phys. D Appl. Phys. 32, 2146 (1999)
14. A.B.R. Kumar, S. Uthanna, B.S. Naidu, P.S. Reddy, J. Indian Inst. Sci. 81, 573 (2001)
15. R. Dannenberg, P. Greene, Thin Solid Films 360, 122 (2000)
16. M. Vergohl, N. Malkomes, T. Staedler, T. Matthee, U. Richter, Thin Solid Films 351, 42 (1999)
17. D. Franta, I. Ohlidal, Vaccum 80, 159 (2005)
18. F.H. Dulin, D.E. Rase, J. Am. Ceram. Soc. 43, 125 (1960)
19. S.F. Bartram, R.A. Slepetys, J. Am. Ceram. Soc. 44, 493 (1961)
20. S.F. Wang, M.K. Lu, F. Gu, C.F. Song, D. Xu, D.R. Yuan, G.J. Zhou, Y.X. Qi, Inorg. Chem. Commun. 6, 185 (2003)
21. H.T. Kim, S. Nahm, J.D. Byun, J. Am. Ceram. Soc. 82, 3476 (1999)
22. H. Obayashi, Y. Sakurai, T. Gejo, J. Solid State Chem. 17, 299 (1976)
23. Z.M. Huang, Z.H. Zhang, C.P. Jiang, J. Yu, J.L. Sun, J.H. Chu, Appl. Phys. Lett. 77, 3651 (2000)
24. W.H. Press, B.P. Flannery, S.A. Teukolsky, W.T. Vetterling, Numerical Recipies in Pascal (Cambridge University Press, Cambridge, 1990), Chapt.∈14
25. L.C. Sun, P. Hou, Thin Solid Films 455, 525 (2004)
26. D.A.G. Bruggemann, Ann. Phys. 24, 636 (1935)
27. Z.G. Hu, J.H. Ma, Z.M. Huang, Y.N. Wu, G.S. Wang, J.H. Chu, Appl. Phys. Lett. 83, 3686 (2003)
28. Y.J. Cho, N.V. Nguyen, C.A. Richer, J.R. Ehrstein, B.H. Lee, J.C. Lee, Appl. Phys. Lett. 80, 1249 (2002)
29. G. He, L.D. Zhang, G.H. Li, M. Liu, L.Q. Zhu, S.S. Pan, Appl. Phys. Lett. 86, 232901 (2005)
30. F. Yakuphanoglu, M. Sekeyci, A. Balaban, Opt. Mater. 27, 1369 (2005)
31. J. Rodríguez, M. Gómez, J. Ederth, G.A. Niklasson, C.G. Granqvist, Thin Solid Films 365, 119 (2000)