Cleaning technology for EUV multilayer mirror using atomic hydrogen generated with hot wire

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 839-843

  Motai, Kumi ^a   Oizumi, Hiroaki ^a,b   Miyagaki, Shinji ^a   Nishiyama, Iwao ^a   Izumi, Akira ^b   Ueno, Tomoya ^b   Namiki, Akira ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic hydrogen; Cleaning; Deoxidization; EUV lithography; Hydrogen radicals density; Ru capped mirror; Transport

Indexed keywords

ABSORPTION; HYDROGEN; LITHOGRAPHY; MULTILAYERS; OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN; DEOXIDIZATION; HYDROGEN RADICALS DENSITY; ULTRAVIOLET LITHOGRAPHY;

MIRRORS;

EID: 36749045146     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.182     Document Type: Article

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