Fabrication of multiplex quasi-three-dimensional grids of one-dimensional nanostructures via stepwise colloidal lithography

Nano Letters

Volumn 7, Issue 11, 2007, Pages 3410-3413

  Zhang, Gang ^a,b   Wang, Dayang ^a   Möhwald, Helmuth ^a  

^a MAX PLANCK INSTITUTE OF COLLOIDS AND INTERFACES   (Germany)

^b JUIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDS; ELECTRODEPOSITION; LITHOGRAPHY; MONOLAYERS; PLASMA ETCHING; STACKING FAULTS;

COLLOIDAL LITHOGRAPHY; ONE-DIMENSIONAL NANOSTRUCTURES; PLASMA ETCHED MONOLAYERS; STEPWISE DEPOSITION;

NANOSTRUCTURES;

METAL NANOPARTICLE; NANOMATERIAL; NANOPARTICLE; NANOTUBE; NANOWIRE; OXYGEN;

ARTICLE; CHEMISTRY; COLLOID; CONFORMATION; CRYSTALLIZATION; ELECTRONICS; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; TIME;

COLLOIDS; CRYSTALLIZATION; ELECTRONICS; METAL NANOPARTICLES; MICROSCOPY, ELECTRON, SCANNING; MOLECULAR CONFORMATION; NANOPARTICLES; NANOSTRUCTURES; NANOTECHNOLOGY; NANOTUBES; NANOWIRES; OXYGEN; TEMPERATURE; TIME FACTORS;

EID: 36749007968     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl071820d     Document Type: Article

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