Magnetically enhanced 15 kHz glow discharge of methane

Plasma Chemistry and Plasma Processing

Volumn 27, Issue 6, 2007, Pages 659-667

  Ledernez, L ^a   Olcaytug, F ^a   Urban, G A ^a   Yasuda, H K ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

Author keywords

AF magnetron glow discharge; Deposition kinetic; Methane; Refractive index

Indexed keywords

GLOW DISCHARGE PARAMETERS; LUMINOUS GAS PHASE; POLYMERIC FILMS;

CHEMICAL VAPOR DEPOSITION; DISCHARGE LAMPS; MAGNETIC FIELD EFFECTS; PARAMETER ESTIMATION; PLASMA POLYMERIZATION; REFRACTIVE INDEX; SINGLE CRYSTALS;

METHANE;

EID: 36448965996     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-007-9098-7     Document Type: Article

References (10)

1. Reinberg A (1979) Plasma deposition of inorganic thin films. Ann Rev Mater Sci 9:341-347
2. Yasuda H, Yu Q (2004) Creation of polymerizable species in plasma polymerization. Plasma Chem Plasma Process 24(2):325-351
3. Chapman B (1980) Glow discharge processes. John Wiley & Sons, Inc., New York
4. Lieberman MA, Lichtenberg AJ (1994) Principles of plasma discharges and materials processing. Wiley, New York
5. Window B, Savvides N (1986) Charged particle fluxes from planar magnetron sputtering sources. J Vac Sci Technol A4:196-202
6. Tompkins H (1993) A user's guide to ellipsometry. Academic Press
7. Yasuda HK (2005) Some important aspects of plasma polymerization. Plasma Process Polym 2(4):293-304
8. Yasuda H, Yu Q (2004) Cathode glow polymerization of trimethylsilane. J Vac Sci Technol A 22(3):472-476
9. Yasuda HK, Yu QS (2001) Deposition of trimethylsilane in glow discharges. J Vac Sci Technol A19(3):773
10. Miyama M, Yasuda H (1998) Direct current cathodic glow discharge polymerization of methane and butane. J Appl Polym Sci 70:237-245