Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Satake, Masaki ^a   Kariya, Mitsuyo ^a   Tanaka, Satoshi ^a   Hashimoto, Kohji ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Hotspot; Mask quality assurance; Mask topography effects; Prediction accuracy

Indexed keywords

COMPUTER SIMULATION; IMAGE PROCESSING; MATHEMATICAL MODELS; QUALITY ASSURANCE; TOPOGRAPHY;

HOTSPOT; MASK QUALITY ASSURANCE; MASK TOPOGRAPHY EFFECTS; PREDICTION ACCURACY;

MASKS;

EID: 36249008997     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728962     Document Type: Conference Paper

References (9)

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