Hybrid EB-writing technique with a 50 kV-VSB writer and a 100 kV-SB writer for nanoimprint mold fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Ishikawa, Mikio ^a   Sakaki, Masashi ^a   Kuwahara, Naoko ^a   Fujita, Hiroshi ^a   Takikawa, Tadahiko ^a   Sano, Hisatake ^a   Hoga, Morihisa ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Electron beam; Hybrid writing; Mold; Nanoimprint; Template

Indexed keywords

ELECTRON BEAMS; NANOIMPRINT LITHOGRAPHY; PHASE SHIFT; PHOTORESISTS; PRINTED CIRCUITS;

CHEMICALLY AMPLIFIED RESIST (CAR); HYBRID WRITING;

MASKS;

LITHOGRAPHY; MASKING; PRINTED CIRCUITS;

EID: 36249001635     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.729045     Document Type: Conference Paper

References (3)

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2. Y. Yoshida, A. Kobiki, T. Hiraka, S. Yusa, S. Sasaki, K. Itou, N. Toyama, M. Kurihara, H. Mohri, N. Hayashi, "NIL template making and imprint evaluation," Proc. SPIE 6349, 63492C 1-8, 2006.
3. S. Yusa, T. Hiraka, A. Kobiki, S. Sasaki, K. Itou, N. Toyama, M. Kurihara, H. Mohri, N. Hayashi, "Progress of NIL template making," Proc. SPIE 6607-124, 2007 (to be published)