NIL template making and imprint evaluation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Yoshida, Yuuichi ^a   Kobiki, Ayumi ^a   Hiraka, Takaaki ^a   Yusa, Satoshi ^a   Sasaki, Shiho ^a   Itoh, Kimio ^a   Toyama, Nobuhito ^a   Kurihara, Masaaki ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Imprint; NIL; Template

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON BEAMS; OPTICAL RESOLVING POWER;

ELECTRON BEAM WRITER; PHOTOMASK; RESOLUTION LIMIT;

NANOTECHNOLOGY;

EID: 33846615911     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692886     Document Type: Conference Paper

References (5)

1. S. Sasaki, K. Itoh, A. Fujii, N. Toyama, H. Mohri, N. Hayashi, "Photomask development for next generation lithography," Proceeding of SPIE, vol. 5853, pp.277-288, 2005.
2. nd European Mask and Lithography Conference,) pp.203-206, 2006.
3. Y. Yoshida, T. Amano, S. Sasaki, K. Itoh, N. Toyama, H. Mohri, N. Hayashi, "Dry etch technology development for NIL template," Proceeding of SPIE, vol. 6283, 62833G, 2006.
4. International Technology Roadmap for Semiconductor, 2005, http://public.itrs.net/
5. M. Tsuneoka, T. Hasebe, T. Tokumoto, C. Yan, M. Yamamoto, D. J. Resnick, E. Thompson, H. Wakamori, M. Inoue, E. Ainley, K. J. Nordquist, W. J. Dauksher, "Direct die to database electron beam inspection for fused silica templates," Proceeding of SPIE, vol. 6349, to be printed, 2006.