Dry etch technology development for NIL template

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 II, Issue , 2006, Pages

  Yoshida, Yuuichi ^a   Amano, Tsuyoshi ^a   Sasaki, Shiho ^a   Itoh, Kimio ^a   Toyama, Nobuhito ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

High resolution; Imprint; IX masks; Mold; Template

Indexed keywords

ETCHING; MOLDS; OPTICAL BEAM SPLITTERS; OPTICAL RESOLVING POWER; OPTIMIZATION; PHOTORESISTS;

HIGH RESOLUTION; IMPRINTS; IX MASKS; TEMPLATES;

NANOTECHNOLOGY;

EID: 33748054794     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681835     Document Type: Conference Paper

References (3)

1. Shiho Sasaki, Kimio Itoh, Akiko Fujii, Nobuhito Toyama, Hiroshi Mohri, and Naoya Hayashi "Photomask process development for next generation lithography", Proceeding of SPIE, vol. 5853, pp. 277-288, 2005.
2. nd European Mask and Lithography Conference EMLC), pp. 203-206, 2006.
3. International Technology Roadmap for Semiconductor, 2005 update, http://public.itrs.net/