Chemical changes of titanium and titanium dioxide under electron bombardment

Materials Research

Volumn 10, Issue 3, 2007, Pages 283-288

  Brasca, Romins ^a   Vergara, Luciana Ines ^b,c   Passeggi, Mario César Guillermo ^b   Ferrón, Julio ^a,b  

^a UNIVERSIDAD NACIONAL DEL LITORAL   (Argentina)

^b Instituto de Desarrollo Tecnologico para la Industria Quimica   (Argentina)

^c UNIVERSITY OF TENNESSEE   (United States)

Author keywords

AES; Electron bombardment; Factor analysis; Titanium; Titanium oxides

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; OXIDATION; REDUCTION; TITANIUM DIOXIDE;

CHEMICAL CHANGES; ELECTRON BOMBARDMENT; FACTOR ANALYSIS;

TITANIUM;

EID: 36148963255     PISSN: 15161439     EISSN: None     Source Type: Journal    
DOI: 10.1590/S1516-14392007000300012     Document Type: Article

References (33)

1. 2 surfaces: Principles, mechanisms, and selected results. Chemical Reviews. 1995; 95(3):735-758.
2. Keister FZ. Thin-film titanium dioxide capacitors for microelectronic applications. Microelectronic Reliability. 1966; 5(1):95.
3. Intemann A, Koemer H, Koch F. Film Properties of CVD titanium nitride deposited with organometallic precursors at low pressure using inert gases, ammonia, or remote activation. Journal of the Electrochemical Society. 1993; 140(11):3215-3222.
4. Muller U, Hauert R. XPS investigation of Ti-O containing diamond-like carbon films. Thin Solid Films. 1996; 290-291(1):323-327.
5. Hanawa T, Ota M. Characterization of surface film formed on titanium in electrolyte using XPS. Applied Surface Science. 1992; 55(4):263-276.
6. Shevell S. Fundamental of Flight. New Jersey: Prentice Hall, Englewoods Cliffs; 1989.
7. Espinós JP, Fernández A, González AR. Oxidation and diffusion processes in nickel-titanium oxide systems. Surface Science. 1993; 295(3):402-410.
8. 3 resists. Applied Physics Letters. 1996; 69(2):170-172.
9. Watanabe H, Fujita J, Ochiai Y, Matsui S, Ichikawa M. Self-developing properties of an inorganic electron beam resist and nanometer-scale patterning using a scanning electron beam. Japanese Journal of Applied Physics. 1995; 34(12B):6950-6955.
10. Langheinrich W, Spangenberg B, Beneking H. Nanostructure fabrication using lithium fluoride films as an electron beam resist. Journal of Vacuum Science and Technology B. 1992; 10(6):2868-2872.
11. 3 thin films. Applied Surface Science. 2004; 229(1-4):301-310.
12. Passeggi Jr. MCG, Vaquila I, Ferrón J. Auger electron spectroscopy and principal component analysis of the first stages of oxidation in GaAs(100). Surface and Interface Analysis. 1993; 20(9):761-765.
13. Passeggi Jr., MCG, Vaquila I, Ferrón J. Auger electron spectroscopy analysis of the first stages of thermally stimulated oxidation of GaAs(100). Applied Surface Science. 1998; 133(1-2):65-72.
14. Malinowski E, Howery D. Factor Analysis in Chemistry. New York: Wiley; 1980.
15. Vidal RA, Ferrón J. Application of Auger electron spectroscopy and principal component analysis to the study of the Pd/c-Si and Pd/a-Si interfaces. Applied Surface Science. 1988; 31(2):263-276.
16. Steren L, Vidal RA, Ferrón J. AES and factor analysis study of silicide growth at the Pd/c-Si interface. Applied Surface Science. 1987; 29(4):418-426.
17. Passeggi Jr. MCG, Vergara LI, Mendoza SM, Ferrón J. Passivation and temperature effects on the oxidation process of titanium thin films. Surface Science. 2002; 507-510(1):825-831.
18. Vaquila I, Passeggi Jr. MCG, Ferrón J. Oxidation process in titanium thin films. Physical Review B. 1997; 55(20):13925-13931.
19. Vaquila I, Passeggi Jr. MCG, Ferrón J. Oxide stoichiometry in the early stages of titanium oxidation. Surface Science. 1993, 292(1-2):L795-L800.
20. Davis LE, Mac Donald NC, Palmberg PW, Riach GE, Weber RE. Handbook of Auger Electron Spectroscopy. Minnesota: Perkin-Elmer, Eden Prairie; 1978.
21. 2. Surface Science. 1975; 51(1):228-236.
22. 2 induced by pulsed ruby-laser irradiation. Journal of Vacuum Science and Technology. 1982; 20(1):51-57.
23. Mitura E, Niedzielska A, Niedzielski P, Klimek L, Rylski A, Mitura S, et al. The properties of carbon layers deposited onto titanium substrates. Diamond and Related Materials. 1996; 5(9):998-1001.
24. Frage N, Froumin N, Dariel MP. Wetting of TiC by non-reactive liquid metals. Acta Materialia. 2002; 50(2):237-245.
25. Szalkouski FJ, Somorjai G. Auger electron spectroscopy investigations of the surface chemical composition of vanadium, the vanadium oxides, and oxidized vanadium: chemical shift and peak intensity analysis. Journal of Chemical Physics. 1972; 56(12):6097-6103.
26. Roman E, Sanchez-Avedillo M, de Segovia JL. AES and ELS study of titanium oxidation in high vacuum. Applied Physics A. 1984; 35(1):35-40.
27. Rao CNR, Sarma DD, Hedge MS. A novel approach to the study of surface oxidation states and oxidation of transition metals by Auger electron spectroscopy. Proceedings of the Royal Society of London A. 1980; 370(1741):269-280.
28. Brasca R, Passeggi Jr. MCG, Ferrón J. Titanium oxidation-reduction at low oxygen pressure under electron bombardment. Thin Solid Films. 2006; 515(4):2021-2025.
29. Gandon J, Joud JC. Analysis of the films of titanium oxides by Auger electron spectroscopy. Journal of the Less-Common Metals. 1980; 69(1):277-291.
30. Vaquila I, Passeggi Jr. MCG, Ferrón J. Temperature effect in the early stages of titanium oxidation. Applied Surface Science. 1996; 93(3):247-253.
31. Knotek ML, Feibelman PJ. Ion desorption by core-hole Auger decay. Physical Review Letters. 1978; 40(14):964-967.
32. Feibelman PJ, Knotek ML. Reinterpretation of electron-stimulated desorption data from chemisorption systems. Physical Review B. 1978; 18(12):6531-6539.
33. Knotek ML, Feibelman PJ. Stability of ionically bonded surfaces in ionizing environments. Surface Science. 1979; 90(1):78-90.