Electron induced reduction on AlF 3 thin films

Applied Surface Science

Volumn 229, Issue 1-4, 2004, Pages 301-310

  Vergara, L I ^a,b   Vidal, R ^a,c   Ferron J ^a,b  

^a Instituto de Desarrollo Tecnologico para la Industria Quimica   (Argentina)

^b UNIVERSIDAD NACIONAL DEL LITORAL   (Argentina)

^c UNIVERSITY OF VIRGINIA   (United States)

Author keywords

Auger electron spectroscopy; Desorption induced by electron stimulation; Factor analysis; Halides; Insulating films

Indexed keywords

ALUMINUM COMPOUNDS; ANNEALING; AUGER ELECTRON SPECTROSCOPY; CARRIER CONCENTRATION; CURRENT DENSITY; DESORPTION; ELECTRIC EXCITATION; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON IRRADIATION; EVAPORATION; ION BOMBARDMENT; MONTE CARLO METHODS; STRUCTURE (COMPOSITION);

DESORPTION INDUCED BY ELECTRON STIMULATION; FACTOR ANALYSIS; HALIDES; INSULATING FILMS;

THIN FILMS;

EID: 2342613521     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.02.008     Document Type: Article

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