|
|
Volumn 34, Issue 12, 1995, Pages 6950-6955
|
|
Self-developing properties of an inorganic electron beam resist and nanometer-scale patterning using a scanning electron beam
|
|
Author keywords
Auger electron spectroscopy; Electron beam lithography; Electron stimulated desorption; Inorganic electron beam resist; Nanofabrication; Scanning electron microscope; X ray photoelectron spectroscopy
|
|
Indexed keywords
ALUMINUM COMPOUNDS;
AUGER ELECTRON SPECTROSCOPY;
DESORPTION;
FLUORINE;
IN SITU PROCESSING;
ION BEAMS;
LITHIUM COMPOUNDS;
NANOTECHNOLOGY;
PHOTORESISTS;
SCANNING ELECTRON MICROSCOPY;
SPUTTERING;
X RAY PHOTOELECTRON SPECTROSCOPY;
ELECTRON STIMULATED DESORPTION;
INORGANIC ELECTRON BEAM RESIST;
LITHIUM FLUORIDE;
NANOMETER SCALE PATTERNING;
SCANNING ELECTRON BEAM;
ELECTRON BEAM LITHOGRAPHY;
|
|
EID: 0029542292
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.34.6950 Document Type: Article |
|
Times cited : (18)
|
|
References (10)
|
