In situ etch rate measurements of thin film combinatorial libraries

Applied Surface Science

Volumn 254, Issue 3, 2007, Pages 687-691

  Perkins, J D ^a   van Hest, M F A M ^a   Teplin, C W ^a   Dabney, M S ^a   Ginley, D S ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

Combinatorial material science; In situ measurements; Sputtering; Thin film

Indexed keywords

CHARGE COUPLED DEVICES; ETCHING; FILM THICKNESS; OPTICAL FIBERS; REFLECTION; SPECTROMETERS;

COMBINATORIAL MATERIAL SCIENCE; IN SITU CHARACTERIZATION TOOLS; IN SITU MEASUREMENTS; OPTICAL REFLECTION MAPPING;

THIN FILMS;

EID: 36148956583     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.05.094     Document Type: Article

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