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Thin Solid Films

Volumn 516, Issue 2-4, 2007, Pages 336-339

Microstructure and mechanical properties of B4C films deposited by ion beam sputtering

(4) Zhou, M J a Wong, S F b Ong, C W b Li, Quan a

a CHINESE UNIVERSITY OF HONG KONG (Hong Kong)

b HONG KONG POLYTECHNIC UNIVERSITY (Hong Kong)

Author keywords

Boron carbide; Ion beam sputtering; Thin films

Indexed keywords

BORON CARBIDE; ION BEAMS; MECHANICAL PROPERTIES; MICROSTRUCTURE; NANOINDENTATION; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERNAL STRESS; ION BEAM SPUTTERING; STONEY'S EQUATION; SUBSTRATE TEMPERATURES;

THIN FILMS;

EID: 36148954648 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2007.06.030 Document Type: Article

Times cited : (41)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.