Angle-dependent measurement of near edge X-ray absorption fine structure of annealing effect on local structure of focused-ion-beam chemical vapor deposition diamond-like carbon

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 11, 2007, Pages 7512-7513

  Saikubo, Akihiko ^a,b   Kanda, Kazuhiro ^a,b   Kato, Yuri ^a,b   Igaki, Jun Ya ^a,b   Kometani, Reo ^a,b   Matsui, Shinji ^a,b  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Annealing effect; Diamond like carbon; Focused ion beam chemical vapor deposition; Incidence angle dependence; Near edge X ray absorption fine structure; Residual gallium

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOCUSED ION BEAMS; SEMICONDUCTING GALLIUM COMPOUNDS; SURFACE STRUCTURE; X RAY ABSORPTION SPECTROSCOPY;

ANNEALING EFFECTS; FOCUSED-ION-BEAM CHEMICAL VAPOR DEPOSITION; INCIDENCE ANGLE DEPENDENCE; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE; RESIDUAL GALLIUM;

DIAMOND LIKE CARBON FILMS;

EID: 35948973590     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.7512     Document Type: Article

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