SCOPUS 정보 검색 플랫폼

Volumn 517, Issue , 2006, Pages 232-236

Fabrication and characterization of uniform quantum size porous silicon

Author keywords

Infrared spectroscopy; Porous silicon; Surface passivation

Indexed keywords

ETCHING; INFRARED SPECTROSCOPY; MICROSTRUCTURE; PASSIVATION; QUANTUM CONFINEMENT; SURFACE PROPERTIES;

ETCHING BATH; HIGH ETCHING CURRENTS; QUANTUM SIZE POROUS SILICON; SURFACE PASSIVATION;

POROUS SILICON;

EID: 35748974516 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/0-87849-404-9.232 Document Type: Conference Paper

Times cited : (5)

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