Anisotropic relaxation behavior of compressive residual stress in delafossite CuAlO 2

Journal of the Electrochemical Society

Volumn 154, Issue 12, 2007, Pages

  Yu, Ruei Sung ^a   Tasi, Du Cheng ^a   Chu, Rong Shian ^a   Huang, Chueh Jung ^b   Shieu, Fuh Sheng ^a,c  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^b HSIUPING INSTITUTE OF TECHNOLOGY   (Taiwan)

^c ELECTROCHEMICAL SOCIETY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC RELAXATIONS; COMPRESSIVE RESIDUAL STRESSES; DUMBBELL LAYERS; FILM SURFACES;

ANISOTROPY; COMPRESSIVE STRESS; COPPER COMPOUNDS; RESIDUAL STRESSES; SILICON COMPOUNDS;

OXIDE FILMS;

EID: 35548945312     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2790284     Document Type: Article

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