Optical and structural characteristics of tin oxide thin films deposited by filtered vacuum arc and spray pyrolysis

Physica Status Solidi (A) Applications and Materials Science

Volumn 204, Issue 10, 2007, Pages 3278-3285

  Cetinorgu E ^a,b   Gumus C ^b   Goldsmith, S ^a   Mansur, F ^b  

^a TEL AVIV UNIVERSITY   (Israel)

^b CUKUROVA UNIVERSITY   (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

EXTINCTION COEFFICIENTS; FILTERED VACUUM ARC DEPOSITION (FVAD); SPRAY PYROLYSIS; UV FUSED SILICA SUBSTRATES (UVFS);

OPTICAL BAND GAPS; PHOTONS; PYROLYSIS; REFRACTIVE INDEX; SILICA; TIN OXIDES; WAVELENGTH; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 35349003285     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200723081     Document Type: Article

References (27)

1. P. S. Patil, R. K., Kawar, T. Seth, D. P. Amalnerkar, and P. S. Chigare, Ceram. Int. 29, 725 (2003).
2. X. Wu, T. J Coutts, and W. P. Mulligan, J. Vac. Sci. Technol. A 15(3), 1057 (1997).
3. M. Batzill and U. Diebold, Prog. Surf. Sci. 79, 47 (2005).
4. S. Hamzaoui and M. Adnane, Appl. Energy 65, 19 (2000).
5. T. Tabuchi, K. Yamagishi, and Y. Tarui, Jpn. J. Appl. Phys. 26(3), L186 (1987).
6. S.-K. Song, Phys. Rev. B 60(15), 11137 (1999).
7. R. J. Choudhary, S. Shinde, V. N. Kulkarni, T. Venkatesan, K. S. Harshavardhan, M. Strikovski, and B. Hannoyer, Appl. Phys. Lett. 84(9), 1483 (2004).
8. T. M. Racheva and G. W. Critchlow, Thin Solid Films 292(1/2), 299 (1997).
9. K. S. Shamala, L. C. Murthy, and K. Narasimha Rao, Bull. Mater. Sci. 27(3), 295 (2004).
10. H. Demiryont, K. E. Nietering, R. Surowiec, F. I. Brown, and D. R. Platts, Appl. Opt. 26/8, 3803 (1987).
11. A. Ben-Shalom, L. Kaplan, R. L. Boxman, S. Goldsmith, and M. Nathan, Thin Solid Films 236, 20 (1993).
12. N. Parkansky, B. Alterkop, S. Goldsmith, and R. L. Boxman, J. Vac. Sci. Technol. A 21(6), 1923 (2003).
13. L. Kaplan, V. N. Zhitomirsky, R. L. Boxman, S. Goldsmith, and I. Rusman, Surf. Coat. Technol. 76/77, 181 (1995).
14. B. Alterkop, N. Parkansky, S. Goldsmith, and R. L. Boxman, J. Phys. D, Appl. Phys. 36, 552 (2003).
15. V. N. Zhitomirsky, T. David, R. L. Boxman, S. Goldsmith, A. Verdyan, Ya. M. Soifer, and L. Lapoport, Thin Solid Films 492, 187 (2005).
16. R. L. Boxman and V. N. Zhitomirsky, Rev. Sci. Instrum. 77, 021101 (2006).
17. E. Çetinörgü, S. Goldsmith, and R. L. Boxman, J. Cryst. Growth 299, 259 (2007).
18. E. Çetinörgü, S. Goldsmith, and R. L. Boxman, Semicond. Sci. Technol. 21, 364 (2006).
19. F. Wooten, Optical Properties of Solids (Academic Press Inc., New York, 1972), p. 56.
20. H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, Semiconducting Transparent Thin Films (Institude of Physics Publishing, Bristol, England, 1995), p. 358.
21. E. Ocampo, R. Arce, R. R. Koropecki, and R. H. Buitrago, Sol. Energy Mater. Sol. Cells 36, 327 (1995).
22. S. Shanthi, C. Subramanian, and P. Ramasamy, Cryst. Res. Technol. 34(8), 1037 (1999).
23. S. M. Rozati, Mater. Charact. 57, 150 (2006).
24. S. Samson and C. G. Fonsted, J. Appl. Phys. 44(10), 4618 (1973).
25. Ç. Kiliç and A. Zunger, Phys. Rev. Lett. 88(9), 095501-1 (2002).
26. D. Sumangala Devi Ammal, V. K. Vaidyan, and P. K. Manoj, Mater. Chem. Phys. 93, 194-201 (2005).
27. T. Serin, N. Serin, S. Karadeniz, H. Sari, N. Tuǧluoǧlu, and O. Pakma, J. Non-Cryst. Solids 352, 209 (2006).