Growth of perovskite (Bi, Ln)(Ni0.5Ti0.5)O 3 thin films by RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 10 B, 2007, Pages 6938-6943

  Fukushima, Koji ^a   Kobune, Masafumi ^a   Yamaji, Toru ^a   Tada, Hideto ^a   Mineshige, Atsushi ^a   Yazawa, Tetsuo ^a   Fujisawa, Hironori ^a   Shimizu, Masaru ^a   Nishihata, Yasuo ^b   Mizuki, Jun'ichiro ^b   Yamaguchi, Hideshi ^c   Honda, Koichiro ^c  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

^c FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Bond dissociation energy; Epitaxial growth; rf magnetron sputtering; Template structure; Thin film

Indexed keywords

BINDING ENERGY; ELECTROMAGNETIC FIELDS; EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; HYSTERESIS; MAGNETRON SPUTTERING; THIN FILMS;

BOND DISSOCIATION ENERGY; SINGLE-PHASE PEROVSKITE STRUCTURE; SOLID SOLUTION FILMS; TEMPLATE STRUCTURE;

PEROVSKITE;

EID: 35348974123     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6938     Document Type: Article

References (21)

1. J. F. Scott and C. A. Paz de Araujo: Science 246 (1989) 1400.
2. C. A. Paz de Araujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott, and J. F. Scott: Nature 374 (1995) 627.
3. I. Y. Shen, G. Z. Cao, C. C. Lee, and C. C. Wu: Ferroelectrics 342 (2006) 15.
4. R. J. Ong, D. A. Payne, T. A. Berfield, and N. R. Sottas: J. Eur. Ceram. Soc. 25 (2005) 2247.
5. R. E. Eitel, C. A. Randall, T. R. Shrout, P. W. Rehrig, W. Hackenberger, and S. E. Park: Jpn. J. Appl. Phys. 40 (2001) 5999.
6. S. M. Choi, C. J. Stringer, T. R. Shrout, and C. A. Randall: J. Appl. Phys. 98 (2005) 034108.
7. Y. Inaguma and T. Katsumata: Ferroelectrics 286 (2003) 833.
8. C. A. Randall, R. Eitel, B. Jones, T. R. Shrout, D. I. Woodward, and I. M. Reaney: J. Appl. Phys. 95 (2004) 3633.
9. K. Wittmaack: Surf. Sci. 89 (1979) 668.
10. J. W. Coburn and E. Kay: CRC Crit. Rev. Solid State Sci. 4 (1974) 561.
11. M. Kobune, S. Fujii, K. Akamatsu, R. Takayama, and A. Tomozawa: J. Ceram. Soc. Jpn. 103 (1995) 298.
12. M. Kobune, S. Fujii, R. Takayama, and A. Tomozawa: Jpn. J. Appl. Phys. 35 (1996) 4980.
13. M. Kobune, O. Matsuura, T. Matsuzaki, A. Mineshige, S. Fujii, H. Fujisawa, M. Shimizu, and H. Niu: Jpn. J. Appl. Phys. 39 (2000) 5451.
14. M. Kobune, S. Kojima, Y. Nishioka, and T. Yazawa: J. Jpn. Soc. Powder Powder Metall. 51 (2004) 336.
15. K. Fukushima, M. Kobune, Y. Nishioka, T. Yamaji, T. Yazawa, H. Fujisawa, and M. Shimizu: Trans. Mater. Res. Soc. Jpn. 30 (2005) 97.
16. T. Kobayashi, Y. Noguchi, and M. Miyayama: Jpn. J. Appl. Phys. 43 (2004) 6653.
17. T. Kobayashi, Y. Noguchi, and M. Miyayama: Appl. Phys. Lett. 86 (2005) 012907.
18. H. Sawase, H. Kakemoto, S. Wada, and T. Tsurumi: Trans. Mater. Res. Soc. Jpn. 28 (2003) 197.
19. Y. Inaguma, A. Miyaguchi, and T. Katsumata: Mater. Res. Soc. Symp. Proc. 755 (2003) 471.
20. Y. Nishihata, J. Mizuki, T. Akao, H. Tanaka, M. Uenishi, M. Kimura, T. Okamoto, and M. Hamada: Nature 418 (2002) 164.
21. A. Li, D. Wu, C. Ge, M. Wang, Z. Ming, H. Wang, and M. Wang: Thin Solid Films 375 (2000) 220.