Positioning of cationic silver nanoparticle by using AFM lithography and electrostatic interaction

Applied Surface Science

Volumn 254, Issue 2, 2007, Pages 621-626

  Yonezawa, Tetsu ^a,b   Itoh, Tetsuya ^a   Shirahata, Naoto ^a,c   Masuda, Yoshitake ^a,d   Koumoto, Kunihito ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

AFM; Monolayer; Nanoparticle; Silver

Indexed keywords

ATOMIC FORCE MICROSCOPY; COULOMB INTERACTIONS; HYDROPHILICITY; LITHOGRAPHY; POSITIVE IONS; SILICON WAFERS; SILVER;

AFM LITHOGRAPHY; CATIONIC SILANOL SURFACTANT; FIELD INDUCED OXIDATION (FIO); NANODIMENSIONAL WIDTH;

NANOPARTICLES;

EID: 35348950080     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.06.046     Document Type: Article

References (35)

1. In: Schmid G. (Ed). Nanoparticles (2004), Wiley-VCH, Weinheim
2. Yonezawa T., and Toshima N. New J. Chem. (1998) 1179-1201
3. Daniel M.-C., and Astruc D. Chem. Rev. 104 (2004) 293-346
4. Huang J., Tao A.R., Connor S., He R., and Yang P. Nano Lett. 6 (2006) 524-529
5. Yonezawa T., Onoue S., and Kimizuka N. Chem. Lett. (2002) 1172-1173
6. Nakao S., Torigoe K., Kon-no K., and Yonezawa T. J. Phys. Chem. B 106 (2002) 12097-12100
7. Mendes P.M., Jacke S., Critchley K., Plaza J., Chen Y., Nikitin K., Palmer R.E., Preece J.A., Evans S.D., and Fitzmaurice D. Langmuir 20 (2004) 3766-3768
8. Hornyak G., Kröll M., Pugin R., Sawitowski T., Schmid G., Bovin J.-O., Karsson G., Hofmeister H., and Hopfe S. Chem. Eur. J. 3 (1997) 1951-1956
9. Braun E., Eichen Y., Sivan U., and Ben-Yoseph G. Nature 391 (1998) 775-778
10. Richter J., Seidel R., Kirsch R., Mertig M., Pompe W., Plaschke J., and Schackert H.K. Adv. Mater. 12 (2000) 507
11. Yonezawa T., Onoue S., and Kunitake T. Kobunshi Ronbunshu 56 (1999) 855
12. Warner M.G., and Hutchison J.E. Nat. Mater. 2 (2003) 232
13. Koyfman A.Y., Braun G., Magonov S., Chworos A., Reich N.O., and Jaeger L. J. Am. Chem. Soc. 127 (2005) 11886-11887
14. Woehrle G.H., Warner M.G., and Hutchison J.E. Langmuir 20 (2004) 5982-5988
15. Braun G., Inagaki K., Estabrook R.A., Wood D.K., Levy E., Cleland A.N., Strouse G.F., and Reich N.O. Langmuir 21 (2005) 10699-10701
16. Yonezawa T., Onoue S., and Kimizuka N. Chem. Lett. 34 (2005) 1498-1499
17. Hosogi M., Hashiguchi G., Haga M., Yonezawa T., Kakushima K., and Fujita H. Jpn. J. Appl. Phys. 44 (2005) L955-L957
18. Becerril H.A., Stoltenberg R.M., Monson C.F., and Woolley A.T. J. Mater. Chem. 14 (2004) 611-616
19. Richter J., Mertig M., Pompe W., Mönch I., and Schackert H.K. Appl. Phys. Lett. 78 (2001) 536-538
20. Mertig M., Ciacchi L.C., Seidel R., and Pompe W. Nano Lett. 2 (2002) 841-844
21. Sakamoto Y., Fukuoka A., Higuchi T., Shimomura N., Inagaki S., and Ichikawa M. J. Phys. Chem. B 108 (2004) 853
22. Garno J.C., Yang Y., Amro N.A., Cruchon-Dupeyrat S., Chen S., and Liu G.-Y. Nano Lett. 3 (2003) 389-395
23. Teranishi T., Sugawara A., Shimizu T., and Miyake M. J. Am. Chem. Soc. 124 (2003) 4210-4211
24. Fresco Z.M., and Fréchet J.M. J. Am. Chem. Soc. 127 (2005) 8302-8303
25. Krämer S., Fuierer R.R., and Gorman C.B. Chem. Rev. 103 (2003) 4367-4418
26. Sugimura H., and Nakagiri N. Langmuir 11 (1995) 3623-3625
27. Zheng J., Zhu Z., Chen H., and Liu Z. Langmuir 16 (2000) 4409-4412
28. Li Q., Zheng J., and Liu Z. Langmuir 19 (2003) 166-171
29. Masuda Y., Itoh T., and Koumoto K. Langmuir 21 (2005) 4478-4481
30. Masuda Y., Tomimoto K., and Koumoto K. Langmuir 19 (2003) 5179-5183
31. Cabot B., and Foissy A. J. Mater. Sci. 33 (1998) 3945-3952
32. Yonezawa T., Genda H., and Koumoto K. Chem. Lett. 32 (2003) 194-195
33. Shirahata N., Masuda Y., Yonezawa T., and Koumoto K. Langmuir 18 (2002) 10379-10385
34. Sugimura H., Saito N., Maeda N., Ikeda I., Ishida Y., Hayashi K., Hong L., and Takai O. Nanotechnology 15 (2004) S69-S75
35. Shirahata N., Hozumi A., and Yonezawa T. Chem. Rec. 5 (2005) 145-159