Deposition of single-crystal Ti2 AlN thin films by reactive magnetron sputtering from a 2Ti:Al compound target

Journal of Applied Physics

Volumn 102, Issue 7, 2007, Pages

  Joelsson, T ^a   Flink, A ^a   Birch, J ^a   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MAGNETRON SPUTTERING; PARTIAL PRESSURE; SINGLE CRYSTAL SURFACES; TITANIUM ALLOYS; ULTRAHIGH VACUUM;

ELASTIC RECOIL DETECTION; INTERMETALLIC PHASES; NITROGEN CONTENT; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 35348881469     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2785958     Document Type: Article

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