Adapting immersion exposure to mass production by adopting a cluster of novel resist-coating/developing and immersion-exposure equipment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Fujiwara, Tomoharu ^a   Ishikawa, Jun ^a   Kawakubo, Tadamasa ^a   Ishii, Yuuki ^a   Kyoda, Hideharu ^b   Wakamizu, Shinya ^b   Shimoaoki, Takeshi ^b  

^a NIKON CORPORATION   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

CD uniformity; Defect; Immersion lithography

Indexed keywords

DEFECTS; DEIONIZED WATER; DIMENSIONAL STABILITY; MOISTURE; SEMICONDUCTOR DEVICES; SURFACE ACTIVE AGENTS;

CD UNIFORMITY; IMMERSION LITHOGRAPHY; MASS PRODUCTION; PROMISING TECHNOLOGY;

LITHOGRAPHY;

EID: 35148901150     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711853     Document Type: Conference Paper

References (7)

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