193nm immersion process defect generation and reduction mechanism investigation using analytical methods

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Enomoto, Masashi ^a   Hatakeyama, Shinichi ^a   Niwa, Takafumi ^a   Tomita, Tadatoshi ^a   Kyoda, Hideharu ^a   Kitano, Junichi ^a   Shimura, Satoru ^a   Kawasaki, Tetsu ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

Defect; Immersion exposure; Track process

Indexed keywords

DEFECTS; HYDROPHOBICITY; IONIZATION; PROCESS CONTROL; PRODUCTIVITY; SCANNING;

DEFECT GENERATION; DEFECTIVITY; IMMERSION EXPOSURE; TRACK PROCESS;

LITHOGRAPHY;

EID: 33745591422     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656363     Document Type: Conference Paper

References (4)

1. nd International Symposium on Immersion Lithography, 008(2005)
2. T. Niwa, M. Enomoto, S. Shimura, H. Kyoda, T. Kawasaki, J. Kitano, Proc. SPIE 5753, 799 (2005)
3. Peter De Bisschop, Andreas Erdmann, Andreas Rathsfeld, Proc. SPIE 5754, 243 (2005)
4. D. Kawamura, T. Takeishi, K. Sho, K. Matsunaga, N. Shibata, K. Ozawa, S. Shimura, H. Kyoda, T. Kawasaki, S. Ishida, T. Toshima, Y. Oonishi, S. Ito, Proc. SPIE 5753, 818 (2005)