Developing micro ADI methodology for new litho process monitoring strategies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Mäge, Iris ^a   Seifert, Uwe ^a   Saville, Barry ^b   Tuckermann, Martin ^b  

^a QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

ADI; Dark field inspection; Defectivity; Micro ADI; Previous layer noise; Process monitoring; PWQ; Tool monitoring

Indexed keywords

DARK FIELD INSPECTION; DEFECTIVITY; LAYER NOISE; TOOL MONITORING;

PHOTOLITHOGRAPHY; PROCESS CONTROL; SENSITIVITY ANALYSIS; SPURIOUS SIGNAL NOISE; THICKNESS CONTROL;

PROCESS MONITORING;

EID: 35148891646     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711416     Document Type: Conference Paper

References (4)

1. Ingrid Peterson, Louis Breaux, Andrew Cross, Mike von den Hoff, Successful Demonstration of a Comprehensive Lithography Defect Monitoring Strategy, SPIE 2003.
2. Iris Maege, Beatrix Pinter, Martin Tuckermann, Oreste Donzella; Defect learning with 193nm-Resists, Proceedings for SPIE Microlithography, 2004.
3. Kay Lederer, Barry Saville, Ingrid Peterson, Automated Microdefect Monitoring for 300 mm Lithography, Olin Interface 2002.
4. Mary Jane Brodsky, Scott Halle, Vickie Jophlin-Gut, Lars Liebmann, Don Samuels, Gary Crispo, Kourosh Nafisi, Vijay Ramani, Ingrid Peterson; Process-Window Sensitive Full-Chip Inspection for Design-to-Silicon Optimization in a Sub-Wavelength Era; Proceedings for ASMC, 2005.