New requirements for the cleaning of EUV mask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Rastegar, Abbas ^a   Eichenlaub, Sean ^a   Kapila, Vivek ^a   Kadaksham, Arun John ^a   Marmillion, Pat ^b  

^a SEMATECH   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT DETECTION MEASUREMENTS; SPHERE EQUIVALENT VOLUME DIAMETER (SEVD);

ALUMINA; ATOMIC FORCE MICROSCOPY; CLEANING; DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY;

MASKS;

EID: 35148886728     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712105     Document Type: Conference Paper

References (6)

1. A. Rastegar, S. Eichenlaub "Removal of 30 nm particles on quartz surfaces," Semicon Korea, STS Vol. 2, 93(2007)
2. A. Rastegar, "Challenges in EUV mask blank cleaning," Surface preparation and wafer cleaning workshop, Austin, May 2004
3. P. Kearney, Wonil Cho, E.M. Gullikson, A. Jia, T. Tamura, A. Tajima, H. Kusunose, and C. Jeon, "EUV mask-blank inspection at SEMATECH MBDC with Lasertec M7360," Proc. of SPIE, current volume paper 6517-12-2007
4. S. Han, B. Kim, J. Park, Y. Kim, S. Choi, and W. Han, "The study on causes and control methods of haze contamination" Proc. of SPIE Vol 5645, 109 (2005)
5. A. Rastegar, "Cleaning of clean quartz plates,"Surface preparation and wafer cleaning workshop, Austin, April 2005
6. A. Rastegar, S. Eichenlaub, Y. Ikuta, K. Goncher, H. Popp, P. Marmillion, "A study of damage mechanisms during EUV substrate cleaning,"Proc. of SPIE Vol 6283, 628301(2006)