The study on causes and control methods of haze contamination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5645, Issue , 2005, Pages 109-113

  Han, Sung Jae ^a   Kim, Bo Hye ^a   Park, Jin Hong ^a   Kim, Yong Hoon ^a   Choi, Seong Woon ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Cleaning; Haze; Photocontamination; Photomask

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CONTAMINATION; ELECTRON BEAMS; INTERFACES (MATERIALS); LIGHT SOURCES; LIGHT TRANSMISSION; MASKS; PHOTOCHEMICAL REACTIONS; SCANNING ELECTRON MICROSCOPY; SURFACE CLEANING;

HAZE; HAZE DEFECTS; PHOTOCONTAMINATION; PHOTOMASKS;

PHOTOLITHOGRAPHY;

EID: 20044383237     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.576605     Document Type: Conference Paper

References (3)

1. R.R.Kunz, Experimentation and modeling of Organic Photocontamination on Lithographic Optics, Optical Microlithography VIII, Proceedings of SPIE, Vol. 4000, 474-487, 2000
2. Devon A. Kinkead, Preventing Next Generation Photochemical Contamination of Lithographic Optics, Micromagazine, October, 2001
3. John Mulkens, Christian Wagner, Challenges and Opportunities for 157 nm Mask technology