Scanner-characteristics-aware OPC modeling and correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Tyminski, Jacek K ^a   Zhang, Qiaolin ^b   Lucas, Kevin ^b   Depre, Laurent ^b   VanAdrichem, Paul ^b  

^a NIKON PRECISION INC   (United States)

^b SYNOPSYS INC   (United States)

Author keywords

Model based OPC; OPC modeling; Optical proximity effects (OPEs); Scanner characteristics

Indexed keywords

EID: 35148813035     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711624     Document Type: Conference Paper

References (6)

1. Alfred Kwok-Kit Wong, "Resolution Enhancement Techniques in Optical Lithography", Volume TT47, SPIE Press.
2. John P. Stirniman and Michael L. Rieger, "Spatial-filter models to describe IC lithographic behavior", Proc. SPIE 3051, 469 (1997)
3. Chuang, H.; Gilbert, P.; Grobman, W.; Kling, M.; Lucas, K.; Reich, K.; Roman, B.; Travis, E.; Tsui, P.; Vuong, T.; West, J. 'Practical applications of 2-D optical proximity corrections for enhanced performance of 0.25um random logic devices', Electron Devices Meeting, 1997. Technical Digest. International, 1997, Page(s): 483 -486.
4. Jacek. K. Tyminski, Tomoyuki Matsuyama, Tashiharu Nakashima, Thomas Schmoeller, John Lewellen, 'Polarization Dependent Proximity Effects', SPIE Optical Microlithography XX, San Jose, 25 February-2 March, 2007
5. James P. McGuire, Jr. and Russell A. Chipman, "Polarization aberrations. 1. Rotationally symmetric optical systems", Appl. Opt. 33, 5080-5100 (1994).
6. M. Totzeck, P. Gräupner, T. Heil, A. Göhnermeier, O. Dittmann, D. S. Krähmer, V. Kamenov and D. G. Flagello, "How to describe polarization influence on imaging", Proc. SPIE 5754, 23-37 (2005).