Experimental characterization of the effect of metal dummy fills on spiral inductors

Digest of Papers - IEEE Radio Frequency Integrated Circuits Symposium

Volumn , Issue , 2007, Pages 307-310

  Nan, Lan ^a,b   Mouthaan, Koen ^a   Xiong, Yong Zhong ^b   Shi, Jinglin ^b   Rustagi, Subhash Chander ^b   Ooi, Ban Leong ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

Chemical mechanical polishing process (CMP); CMOS technology; Metal dummy fills; Microwave measurements; Spiral inductors

Indexed keywords

CHARACTERIZATION; CMOS INTEGRATED CIRCUITS; EQUIVALENT CIRCUITS; MATHEMATICAL MODELS; MICROWAVE MEASUREMENT; SCATTERING PARAMETERS;

CHEMICAL-MECHANICAL POLISHING PROCESS (CMP); CMOS TECHNOLOGY; METAL DUMMY FILLS; SPIRAL INDUCTORS;

ELECTRIC INDUCTORS;

EID: 34748839555     PISSN: 15292517     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RFIC.2007.380889     Document Type: Conference Paper

References (6)

1. B. E. Stine, D. S. Boning, J. E. Chung, L. Camilletti, F. Kruppa, E. R. Equi, W. Loh, S. Prasad, M. Muthurishnan, D. Towery, M.Berman, and A. Kappor, "The physical and electrical effects of metal-fill patterning practices for oxide chemical-mechanical polishing processes" IEEE Trans. Electron Devices, vol. 45, no. 3, pp. 665-679, Mar 1998.
2. W. Yu, M. Zhang and Z. Wang, "Efficient 3-D extraction of interconnect capacitance considering floating metal fills with boundary element method," IEEE Trans. Computer-Aided Design of the Integrated Circuit and Systems, vol. 25, issue. 1, pp. 12-18, January 2006.
3. th International conf VLSI design, 3-7, Jan 2006.
4. C. A. Chang, S. P. Tseng, J. Y. Chuang, S. S. Jiang, and J. A. Yeh, "Characterization of spiral inductors with patterned floating structures," IEEE Trans. Microwave Theory & Tech., vol. 52, no. 5, pp. 1375-1381, May 2004.
5. "On-wafer vector network analyzer calibration and measurements," Application Notes, Cascade Microtech, Inc.
6. C. P. Yue and S. S. Wong, "Physical modeling of spiral inductors on silicon," IEEE Trans. Electron Devices, vol. 47, pp. 560-568, March 2000.