Comparison of TiO2 and ZrO2 films deposited by electron-beam evaporation and by sol-gel process

Chinese Physics Letters

Volumn 24, Issue 7, 2007, Pages 1964-1966

  Yao, Jian Ke ^a,b   Li, Hai Yuan ^a,b   Fan, Zheng Xiu ^a   Tang, Yong Xing ^a   Jin, Yun Xia ^a   Zhao, Yuan An ^a   He, Hong Bo ^a   Shao, Jian Da ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; ELECTRON BEAMS; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER DAMAGE; METALLIC FILMS; REFRACTIVE INDEX; SOL-GEL PROCESS; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS; ZIRCONIA;

AMORPHOUS STRUCTURES; DEPOSITED FILMS; ELECTRON BEAM EVAPORATION; ELECTRON-BEAM; FILMS PROPERTIES; FOURIER TRANSFORM-INFRARED SPECTROMETRIES; LASER INDUCED DAMAGE THRESHOLDS; SOLGEL FILMS; TIO 2 AND ZRO 2; ZRO 2 FILMS;

TITANIUM DIOXIDE;

EID: 34548662413     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/24/7/049     Document Type: Article

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