Enhancing the hardness of arc-ion-plated nanocrystallite TiN films

Nanotechnology

Volumn 18, Issue 35, 2007, Pages

  Yu, X ^a   Hua, M ^b   Wang, C B ^a   Liu, Y ^c   Yu, D Y ^c   Ma, S L ^d  

^a CHINA UNIVERSITY OF GEOSCIENCES   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c Beijing Powertech Co Ltd   (China)

^d XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ION BOMBARDMENT; MICROHARDNESS; NANOCRYSTALLINE MATERIALS; SUBSTRATES; VACUUM;

CRYSTALLINE GRAINS; HARDNESS ENHANCEMENT;

TITANIUM NITRIDE;

NANOCRYSTAL; NITROGEN DERIVATIVE; TITANIUM;

ARTICLE; FILM; HARDNESS; NANOANALYSIS; NANOTECHNOLOGY; PRIORITY JOURNAL; SYNTHESIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 34548661310     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/35/355710     Document Type: Article

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