Thermal stability of alkoxy monolayers grafted on Si(1 1 1)

Surface Science

Volumn 601, Issue 18, 2007, Pages 3961-3964

  Dusciac, Dorin ^a   Chazalviel, Jean Noël ^a   Ozanam, François ^a   Allongue, Philippe ^a   de Villeneuve, Catherine Henry ^a  

^a LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

Author keywords

Alkoxy monolayers; Atomic force microscopy; Fourier transform infra red spectroscopy; Hydrosilylation; Thermal grafting

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DESORPTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAFTING (CHEMICAL); HYDROSILYLATION; MICROELECTRONICS; SILICON; THERMODYNAMIC STABILITY;

ALKOXY MONOLAYERS; ALKYL LAYERS; THERMAL GRAFTING;

MONOLAYERS;

EID: 34548647247     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.04.133     Document Type: Article

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