Elimination of organic contaminants from silicon wafers using high concentration ozonated-water

Electrochimica Acta

Volumn 53, Issue 1, 2007, Pages 16-19

  Uemura, Kenichi ^a   Haibara, Teruo ^a   Adachi, Takio ^b  

^a Siltronic Japan Corporation   (Japan)

^b Nittetu Chemical Engineering Ltd   (Japan)

Author keywords

Ozone; Resist; Self decomposition; Silicon; Water

Indexed keywords

CONCENTRATION (PROCESS); DECOMPOSITION; OZONE WATER TREATMENT; SILICON WAFERS; SOLUBILITY;

ORGANIC CONTAMINANTS; OZONATED-WATER; SELF-DECOMPOSITION; ULTRA PURE WATER;

IMPURITIES;

EID: 34548554680     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.04.059     Document Type: Article

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