Process and environmental benefits of HF-ozone cleaning chemistry

Solid State Technology

Volumn 44, Issue 7, 2001, Pages 115-124

  Bergman, E ^a   Lagrange, S ^a  

^a Semitool Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY LAYERS; HYDROFLUORIC ACID; OZONE; SEMICONDUCTOR DEVICE MANUFACTURE; SOLUBILITY; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; THERMAL EFFECTS;

HYDROFLUORIC (HF) OZONE CLEANING;

CHEMICAL CLEANING;

EID: 0035397131     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (5)

1. Characterization of HF-last cleaned Si for gate oxides
2. Investigation of the need for alternative cleaning chemistries for 30Å gate oxides
3. Evaluation of ozonated water spray for resist cleaning applications
4. Photoresist strip process using ozone diffusion through a controlled aqueous boundary layer
5. The evolution of chemical oxides into ultrathin gate oxides: Spectroscopic and electrical characterization