In situ Raman characterization of reversible phase transition in stress-induced amorphous silicon

Applied Physics Letters

Volumn 91, Issue 10, 2007, Pages

  Wu, Kehui ^a   Yan, X Q ^a   Chen, M W ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; CRYSTAL ATOMIC STRUCTURE; PHASE TRANSITIONS; PRECIPITATES; STRESS ANALYSIS; THERMAL EFFECTS;

IN SITU RAMAN CHARACTERIZATION; REVERSIBLE PHASE TRANSITIONS; ROOM TEMPERATURE;

AMORPHOUS SILICON;

EID: 34548515018     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2779933     Document Type: Article

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