A combined top-down/bottom-up approach for the nanoscale patterning of spin-crossover coordination polymers

Advanced Materials

Volumn 19, Issue 16, 2007, Pages 2163-2167

  Molnár, Gábor ^a   Cobo, Saioa ^a   Real, José Antonio ^b   Carcenac, Franck ^c   Daran, Emmanuelle ^c   Vieu, Christophe ^c   Bousseksou, Azzedine ^a  

^a CNRS   (France)

^b UNIVERSITY OF VALENCIA   (Spain)

^c LAAS CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM THICKNESS; MICROMETERS; NANOSTRUCTURED MATERIALS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; WETTING;

HIGH SPATIAL RESOLUTION; NANOSCALE PATTERNING; SPIN CROSSOVER COORDINATION POLYMERS;

POLYMERS;

EID: 34548349306     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200700448     Document Type: Article

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