Influence of substrate temperature and O2 flow on the properties of RF-magnetron-sputtered indium-tin-oxide thin films

Journal of the Korean Physical Society

Volumn 51, Issue 2, 2007, Pages 534-538

  Kim, T S ^a   Choi, C H ^a   Jeong, T S ^a   Shim, K H ^a  

^a Chonbuk National University   (South Korea)

Author keywords

Indium tin oxide; Sputtering; Thin film; Transparent

Indexed keywords

EID: 34548301376     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.51.534     Document Type: Article

References (24)

1. Y. Leterrier, L. Médico, F. Demarco, J.-A. E. Manson, U. Betz, M. F. Escolà, M. Kharrazi Olsson and F. Atamny, Thin Solid Films 460, 156 (2004).
2. N. Kikuchi, E. Kusano, E. Kishio and A. Kinbara, Vacuum 66, 365 (2002).
3. T. Nakada, Y. Hirabayashi, T. Tokado, D. Ohmori and T. Mise, Solar Energy 77, 739 (2004).
4. J. Pla, M. Tamasi, R. Rizzoli, M. Losurdo, E. Centurioni, C. Summonte and F. Rubinelli, Thin Solid Films 425, 185 (2003).
5. A. N. Tiwari, G. Khrypunov, F. Kurdzesau, D. L. Batzner, A. Romeo and H. Zogg, Progress in Photovoltaics: Res. and Appl. 12, 33 (2004).
6. I. Hamberg and C. G. Granqvist, J. Appl. Phys. 60, R123 (1986).
7. H.-C. Lee, J.-Y. Seo, Y.-W. Choi and D.-W. Lee, Vacuum 72, 269 (2004).
8. J.-O. Park, J.-H. Lee, J.-J. Kim, S.-H. Cho and Y. K. Cho, Thin Solid Films 474, 127 (2005).
9. R. Mientus and K. Ellmer, Surface and Coatings Technology 142, 748 (2001).
10. J.-W. Park, J.-W. Park and J.-K. Lee, J. Korean Phys. Soc. 49, S447 (2006).
11. A. I. Ali, C. H. Kim, J. H. Cho and B. G. Kim, J. Korean Phys. Soc. 49, S652 (2006).
12. K. Sreenivas, T. S. Rao and A. Mansingh, J. Appl. Phys. 57, 384 (1985).
13. W. Deng, T. Ohgi, H. Nejo and D. Fujita, Jpn. J. Appl. Phys. 40, 3364 (2001).
14. J. A. Thornton and V. L. Hedgcoth, J. Vac. Sci. Tech. 13, 117 (1976).
15. J. L. Vossen, RCA Rev. 32, 289 (1971).
16. J. R. Bosnell and R. Waghorne, Thin Solid Films 15, 161 (1973).
17. I. Hamberg and C. G. Granqvist, Appl. Phys. Lett. 44, 721 (1984).
18. L. I. Maissel and R. Glang, Handbook of Thin Film Technology (McGrow-Hill, New York, 1970), p. 9.
19. G. Binning, C. F. Quate and Ch. Gerber, Phys. Rev. Lett. 56, 930 (1986).
20. M. Higuchi, M. Sawada and Y. Kuronuma, J. Electrochem. Soc. 140, 1773 (1993).
21. J.-L. Huang and Y.-T. Jah, J. Ceram. Soc. Jpn. 108, 17 (2000).
22. C. V. R. Vasant Kumar and A. Mansingh, J. Appl. Phys. 65, 1270 (1989).
23. A. Mansingh and C. V. R. Vasant Kumar, J. Appl. Phys. 22, 455 (1989).
24. J. Dutta and S. Ray, Thin Solid Films 162, 119 (1988).