Defect structure of silicon crystals implanted with H 2 + ions

Physica Status Solidi (A) Applications and Materials Science

Volumn 204, Issue 8, 2007, Pages 2638-2644

  Shalimov, Artem ^a   Shcherbachev, Kirill D ^b   Bak Misiuk, Jadwiga ^a   Misiuk, Andrzej ^c  

^a INSTITUTE OF PHYSICS   (Poland)

^b NATIONAL UNIVERSITY OF SCIENCE AND TECHNOLOGY MISIS   (Russian Federation)

^c ukasiewicz Research Network Institute of Microelectronics and Photonics   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT CLUSTERS; DIFFUSE SCATTERING; DILATATION;

DEFECT STRUCTURES; HYDROGEN; HYDROSTATIC PRESSURE; ION IMPLANTATION; POSITIVE IONS; SILICON; X RAY SCATTERING;

CRYSTALS;

EID: 34548287943     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200675697     Document Type: Article

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