Optical properties of wurtzite Zn1-xCdxO films grown by remote-plasma-enhanced metalorganic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 4 B, 2007, Pages 2516-2518

  Ohashi, Toshiya ^a   Yamamoto, Kenji ^a   Nakamura, Atsushi ^a   Aoki, Toru ^a   Temmyo, Jiro ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Band gap; Refractive index; Remote plasma enhanced MOCVD; RF power; Zn1 xCdxO

Indexed keywords

FILM GROWTH; GROWTH TEMPERATURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; ZINC COMPOUNDS;

MOLAR FUNCTIONS; REMOTE PLASMA ENHANCED MOCVD; RF POWER; RFE-MOCVD;

THIN FILMS;

EID: 34547916510     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.2516     Document Type: Article

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