Large-area X-ray lithography system for LIGA process operating in wide energy range of synchrotron radiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5500-5504

  Utsumi, Yuichi ^a   Kishimoto, Takefumi ^a   Hattori, Tadashi ^a   Hara, Hirotsugu ^b  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOYAMA Corporation   (Japan)

Author keywords

LIGA; Lithography; Microsystem; Synchrotron radiation; X ray

Indexed keywords

ASPECT RATIO; MICROSTRUCTURE; SYNCHROTRON RADIATION; X RAY ANALYSIS;

LIGA; MICROSYSTEM; X-RAY;

LITHOGRAPHY;

EID: 31844447370     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5500     Document Type: Article

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