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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 8 A, 2007, Pages 5139-5142

Oblique ion nano-texturing technology for longitudinal recording media

(4) Sato, Kenji a Okamoto, Iwao a Kitamoto, Yoshito a Ishida, Shoji a

a Yamagata Fujitsu Limited (Japan)

Author keywords

Anisotropic media; Ion beam etching; Ripple structure; Self ordering; Texture

Indexed keywords

ION BEAMS; TEXTURES; THERMODYNAMIC STABILITY;

ANISOTROPIC MEDIA; CURRENT MECHANICAL TEXTURE; ION BEAM ETCHING; RIPPLE STRUCTURE;

NANOSTRUCTURED MATERIALS;

EID: 34547873926 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.5139 Document Type: Article

Times cited : (10)

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